Our company produces various kinds of Metal target materials, ceramic target materials and Alloy target materials by smelting and powder metallurgy, we can provide customer with one-single-metal target materials, ceramic target materials and alloy target materials which are of different types and used in production of various kinds of thin film materials.
The Metals sputtering targets are:Aluminum (Al), Antimony (Sb), Barium (Ba), Bismuth (Bi), Cerium (Ce), Chromium (Cr), Copper (Cu), Cadmium (Cd), Dysprosium (Dy), Erbium (Er), Europium (Eu), Gold (Au), Gadolinium (Gd), Germanium (Ge), Holmium (Ho), Hafnium (Hf), Indium (In), Iridium (Ir), Iron (Fe), Lanthanum (La), Lutetium (Lu), Lead (Pb), Magnesium (Mg), Molybdenum (Mo), Niobium (Nb), Neodymium (Nd), Nickel (Ni), Praseodymium (Pr), Platinum (Pt), Rhenium (Re), Ruthenium (Ru), Scandium (Sc), Silicon (Si), Samarium (Sm), Silver (Ag), Selenium (Se), Tantalum (Ta), Terbium (Tb), Titanium (Ti), Thulium (Tm), Vanadium (V), Tungsten (W), Ytterbium (Yb), Yttrium (Y), Zirconium (Zr), Zinc (Zn), Purity:From 99% to 99.9999%, Shape:Foil, sheet, wire, rod, tube, powder, ingot.
The alloy sputtering targets are:Al-Ag alloy, Al-Si alloy, Ag-Pt alloy, Ag-Cu alloy, Al-Cr alloy, Bi-Te alloy, Ce-Gd alloy, Cu-Ce alloy, Ce-Sm alloy, Co-Zr alloy, Co-Cr alloy, Co-Ni alloy, Co-Fe, alloy, Cr-V, alloy Cr-B, alloy Cr-Cu alloy, Co-Ni-Cr alloy, Dy-Fe alloy, Gd-Fe alloy, Gd-Fe-Co alloy, Hf-Fe alloy, La-Y alloy, La-Fe alloy, La-Ti alloy, La-Sc alloy, La-Ni alloy, Mn-Fe alloy, Mn-Ni alloy, Ni-Fe alloy, Ni-Ti alloy, Ni-V alloy, Ni-Cr alloy, Nd-Dy-Fe-Co alloy, Pr-Nd alloy, Sm-Fe alloy, Tb-Fe alloy, TbDyFe alloy, Ti-Al alloy, Ti-Nd alloy, TiCo alloy, Tb-Fe-Co alloy, Tb-Gd-Fe-Co alloy, W-Ti alloy targets, Y-Al alloy, Y-Cr alloy, Zr-Ti alloy, Zr-Ni alloy, Zr-Nb alloy, Zr-Al alloy, Zr-Cu alloy, Zr-Y alloy, Zr-Hf alloy.
Purity:99.5% to 99.99%.Shape:Foil, Rod, Wire, Bar, Sheet, Plate;
The Ceramic sputtering targets are:MgO, MgF2, Nb2O5 Al2O3, ZAO, ZNO, ZGO, ZBO, ITO, LaAlO3, LiNbO3, LiTaO3, SiO, SrTiO3, SiO2, SiC, , TiO2, Ta2O5, ZnO, ZrO2, .ZrO2-Y2O3 stabilized (YSZ) CeO2, Nd2O3, Dy2O3, Gd2O3, Lu2O3, Y2O3, Yb2O3, NdF3, YF3, YbF3.
The Metals sputtering targets are:Aluminum (Al), Antimony (Sb), Barium (Ba), Bismuth (Bi), Cerium (Ce), Chromium (Cr), Copper (Cu), Cadmium (Cd), Dysprosium (Dy), Erbium (Er), Europium (Eu), Gold (Au), Gadolinium (Gd), Germanium (Ge), Holmium (Ho), Hafnium (Hf), Indium (In), Iridium (Ir), Iron (Fe), Lanthanum (La), Lutetium (Lu), Lead (Pb), Magnesium (Mg), Molybdenum (Mo), Niobium (Nb), Neodymium (Nd), Nickel (Ni), Praseodymium (Pr), Platinum (Pt), Rhenium (Re), Ruthenium (Ru), Scandium (Sc), Silicon (Si), Samarium (Sm), Silver (Ag), Selenium (Se), Tantalum (Ta), Terbium (Tb), Titanium (Ti), Thulium (Tm), Vanadium (V), Tungsten (W), Ytterbium (Yb), Yttrium (Y), Zirconium (Zr), Zinc (Zn), Purity:From 99% to 99.9999%, Shape:Foil, sheet, wire, rod, tube, powder, ingot.
The alloy sputtering targets are:Al-Ag alloy, Al-Si alloy, Ag-Pt alloy, Ag-Cu alloy, Al-Cr alloy, Bi-Te alloy, Ce-Gd alloy, Cu-Ce alloy, Ce-Sm alloy, Co-Zr alloy, Co-Cr alloy, Co-Ni alloy, Co-Fe, alloy, Cr-V, alloy Cr-B, alloy Cr-Cu alloy, Co-Ni-Cr alloy, Dy-Fe alloy, Gd-Fe alloy, Gd-Fe-Co alloy, Hf-Fe alloy, La-Y alloy, La-Fe alloy, La-Ti alloy, La-Sc alloy, La-Ni alloy, Mn-Fe alloy, Mn-Ni alloy, Ni-Fe alloy, Ni-Ti alloy, Ni-V alloy, Ni-Cr alloy, Nd-Dy-Fe-Co alloy, Pr-Nd alloy, Sm-Fe alloy, Tb-Fe alloy, TbDyFe alloy, Ti-Al alloy, Ti-Nd alloy, TiCo alloy, Tb-Fe-Co alloy, Tb-Gd-Fe-Co alloy, W-Ti alloy targets, Y-Al alloy, Y-Cr alloy, Zr-Ti alloy, Zr-Ni alloy, Zr-Nb alloy, Zr-Al alloy, Zr-Cu alloy, Zr-Y alloy, Zr-Hf alloy.
Purity:99.5% to 99.99%.Shape:Foil, Rod, Wire, Bar, Sheet, Plate;
The Ceramic sputtering targets are:MgO, MgF2, Nb2O5 Al2O3, ZAO, ZNO, ZGO, ZBO, ITO, LaAlO3, LiNbO3, LiTaO3, SiO, SrTiO3, SiO2, SiC, , TiO2, Ta2O5, ZnO, ZrO2, .ZrO2-Y2O3 stabilized (YSZ) CeO2, Nd2O3, Dy2O3, Gd2O3, Lu2O3, Y2O3, Yb2O3, NdF3, YF3, YbF3.