1) Applied in Quartz Tube cleaning and etching, horizontal or vertical mode available;
2) Process flow: Designed as customer required, available function including etching, cleaning, ultrasonic, heating, drying and others;

3) Control mode: Manual, semi-auto, Auto. ;

4) Material: Depending on process and customer requirement, available matierials eg. PP, PVC, PVDF, Quartz Tube, Stainless steel and others;

Features and benefits:

A. Vertical cleaning technology have been awarded patent;

B. Module design; Depending on customer requriment and process, offer special solution;

C. Customization based on customer budget;

D. Optimum wet cleaning solution;

E. High PPR;

F. Various options available: ;

G. Operator friendly and safe;

H. Easy maintenance;

Non-standard product, please contact for special process solution with your requirement!

For more product infos, please download: CSE Semiconductor Product Catalogue.

3. Wafer Dryer.

1) Applied in wafer's rinsing and drying;
2) Spin-rinsing and drying, N2 drying, chamber drying, Auto door opening after processing finished, auto processing flow including working condition display and fault alarm;

3) Material: Stainless steel;

Features and benefits:

A.   Airproof;

B  Spin device through exact dynamic& static balance testing; Ensure system balance and reduce shock;

C  Auto control mode;

D  Steady, safety and reliable;

E  Electricity defend;

F  Precess control intelligentizing, reliable designing;

G  Operate easily;

Non-standard product, please contact for special process solution with your requirement!

For more product infos, please download: CSE Semiconductor Product Catalogue.