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Specifications

Description

 

Metal target for thin metal coating and metal powder for fine metal.
This Accuracy Mo and Wo sheets, plates, rods, glass melting electrodes, sapphire growing crucibles, materials for use with the oil and gas industries, Mo, Wo, NiCr, Ni targets, and large dimensions Cr targets used with the architectural glass TFT technologies.
 
1)Sputtering Target ;
Chromium sputtering targets
Nickel-chromium sputtering targets
Tungsten sputtering targets
Molybdenum sputtering targets
Nickel sputtering targets
Titanium sputtering targets
2)Perm alloy
Ni-Cr target
ITO target
Other alloy target
Specification

 

Metal target of Sputtering spec should be meet customer’s requirement ;
 
1)Purity: ≥ 3N (99.9%), 3N5(99.95%), to≥ 4N (99.99%)
2)Dimensions: according to the customers' requests.
3)Backing plate: Can be bonded on Cu, Ti and Mo backing plate. Certificate of bonding will be provided along with the product.
 Application

 

1)    The target of PVD, CVD and Evaporation and Soldering ;
Touch panel
Mobile phone decoration window
LCD
Special PCB
Glass window