Practical applications of the product
-. Track system ( Coater and developer ) for Photo resistor
-. Wafer Cleaning Machine
-. Fine and micro driving system for automation system
Specification
Rated output / Dimension : 400 W / 60mm*60mm
Rated Voltage : 220 V Ac
Rotation speed : 5000 rpm
Maximum speed : 7000 rpm
Rated Torque : 0.76 N.m
Maximum Torque : 2.28 N.m
Structure : Frame Type
Normal Resistance : 1.84 Ohm
Normal Inductance : 5.32 mH
Applicable Wafer : 2 inches ~ 8 inches
-. Track system ( Coater and developer ) for Photo resistor
-. Wafer Cleaning Machine
-. Fine and micro driving system for automation system
Spin Servo motor which can be applied for Automation equipment, Track ( Wafer coater and developer for Semiconductor) and also be applied for Wafer cleaning equipment. This servo spin motor is especially developed for semiconductor machine which can be operated by direct driving control system.
Specification
Rated output / Dimension : 400 W / 60mm*60mm
Rated Voltage : 220 V Ac
Rotation speed : 5000 rpm
Maximum speed : 7000 rpm
Rated Torque : 0.76 N.m
Maximum Torque : 2.28 N.m
Structure : Frame Type
Normal Resistance : 1.84 Ohm
Normal Inductance : 5.32 mH
Applicable Wafer : 2 inches ~ 8 inches