Hi vacuum PVD ( Physical Vapor Deposition ) coating equipment
Linear system with vertical deposition arrangement
Deposition area by MC design
One- or double-sided application of films in one transmission (depending on system configuration)
Loading-unloading of substrates in one point of a clean room, no necessity of a return conveyer
Organization of cryogen and turbo-molecular pumping out for reduction of the servicing time and duration of system launching.
Reactive application with double magnetrons or DC magnetron deposition.
Organization of symmetrical pumping out of the deposition area for guaranteed uniformity of deposition
Organization of carriages motion without any clearance in the deposition area for effective use of deposited targets
Reactive deposition control system for high speed deposition
Cycle period – from 45 seconds depending on the technological process.

Specification

Ultimate pressure : 3.0 x 10-6Torr bellow
Pumping speed : 5.0 x 10-5Torr/5min below
urbo Pumper : Made in Germany  - Hi speed vacuum Piffier
Gas Flow Auto control system : Made in Germany – Sensing and control by automatic to make hi performance surface uniformity. And prevent the arcing.
Processing capacity
Heater material : Sheath Heater
Coating material : TiO2,ITO,AL,Cr,SiO2,SnO
Gas : O2, Ar, Nitride


Practical applications of the product
Vertical-type technological line is intended for deposition of color decorative coatings on flat substrates :
Display product ( ITO glass coating, Transparence coating
Metal coating (PMMA, Polymer film Coating)
Oxide material and nitrides ( EMI, EMC cutting coating )
Optical coatings ( LENs coating )
Glass coating for Car mirror
Other decoration coating