Electronic Phosphorous acid
cas 7664-38-2
Phosphoric Acid (Electronic Grade)
Molecular Formula :H3PO4
Molecular weight: 98.00
Molecular weight: 98.00
Physical and Chemical Properties:
It is colorless, transparent and rhombic crystal. Relative density:1.834(18degree), Melting point:42.35degree,Boiling point:213degree .When the density is 85%-98%, H3PO4 presents itself as sticky and thick liquid. H3PO4 is an odorless acid. It changes to HPO3 when heated to 300degree. H3PO4 is easily soluble in water and soluble in alcohol. It is less acidic than H2SO4, HCl and HNO3, and more acidic than CH3COOH and H3BO3. H3PO4 is a non-oxidation acid, but it can stimulate the skin to cause inflammation and damage organism tissue when exposed to skin.
It is colorless, transparent and rhombic crystal. Relative density:1.834(18degree), Melting point:42.35degree,Boiling point:213degree .When the density is 85%-98%, H3PO4 presents itself as sticky and thick liquid. H3PO4 is an odorless acid. It changes to HPO3 when heated to 300degree. H3PO4 is easily soluble in water and soluble in alcohol. It is less acidic than H2SO4, HCl and HNO3, and more acidic than CH3COOH and H3BO3. H3PO4 is a non-oxidation acid, but it can stimulate the skin to cause inflammation and damage organism tissue when exposed to skin.
Usage:
It is mainly used as the cleaning and etching agent in TFT-LCD and IC production. It is also used as the etchant for etching Aluminum and Silicon Nitride film in semi-silicon IC. It is also the main stuff of some high-purity phosphates and organic phosphorus products.
It is mainly used as the cleaning and etching agent in TFT-LCD and IC production. It is also used as the etchant for etching Aluminum and Silicon Nitride film in semi-silicon IC. It is also the main stuff of some high-purity phosphates and organic phosphorus products.