Product Main

Specifications

Name: Copper sputtering target, Copper target, Copper alloy sputtering target

A) Material: Copper
     Purities: 4N5,5N
     Application:Electronics& Semiconductor
B) Material: Copper
     Purities: 4N,4N7
     Application: Display
C) Material: Copper Chromium
      Purities: 3N5
      Application: Electronics& Semiconductor
D) Material:Copper Indium
     Purities: 4N
     Application: Photovoltaics
E) Material: Copper Nickel
     Purities: 3N5
     Application: Electronics& Semiconductor
F) Material: Copper Indium Gallium
     Purities: 4N
     Application: Photovoltaics

Purity:99.9-99.999%
Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle, and customer tailored.
To provide specifications of aluminum target supporter, Titanium supporter, copper target supporter, Titanium target supporter.