Material: Tantalum Target
Grade: RO5200, RO5252, RO5255
Purity: 99.95% or 99.99%
Products: sputtering target, disk
Grade: RO5200, RO5252, RO5255
Purity: 99.95% or 99.99%
Products: sputtering target, disk
Tantalum sputtering targets, Tantalum- tungsten Alloy targets
Material:RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W)
Size:
circular targets:Diameter 15mm up to 400mm x Thickness 3mm up to 28mm
rectangular targets:Thickness 1mm up to 40mm x Width up to 1000mm x Length up to 3000mm
Material:RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W)
Size:
circular targets:Diameter 15mm up to 400mm x Thickness 3mm up to 28mm
rectangular targets:Thickness 1mm up to 40mm x Width up to 1000mm x Length up to 3000mm
Table 1: technology parameter
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Grade
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3N, 3N5, 4N, with Ta 99.99％min
|
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Recrystallization
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95％min
|
|
Grain size
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ASTM 4 or finer
|
|
Surface finish
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16Rms max. or Ra 0.4 ( RMS64 or better)
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|
Flatness
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0.1mm or 0.15％ max
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|
Tolerance
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+/-0.010" on all dimensions
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