Titanium Sputtering Target 


We supply metal and alloy sputtering target for PVD film coating industry with kinds of materials which purity ranges from 99.9% to 99.999%

 

Available materials (A-Z):

Aluminium

Chromium

Copper

Molybdenum

Nickel, Ni-Cr, Ni-V

Niobium, Nb-Zr

Silicon

Sliver / Gold

Tantalum, Ta-W

Titanium, Ti-Al, Ti-Cr, Ti-Ni, Ti-Si, Ti-Zr

Tungsten, W-Re

Zirconium, Zr-Nb

Other materials and alloys upon request

 

Surface:

Precisely machined / ground, shinny bright surface

Roughness Ra 1.6, 0.8

 

Forms for sputtering target:

Circular / planar / tubular

Custom-made form as per drawing

 

Specification:

As per general industry standard or customer’s specific demand