I. Water quality>15MΩ.cm
The electronic grade water qualities have been divided into five standards, they are 18MΩ.cm, 15MΩ.cm, 10MΩ.cm, 2MΩ.cm, 0.5MΩ.cm, in order to distinguish different water qualities.
II. Production technologies of semiconductor ultrapure water equipment:
1. Pretreatment→ reverse osmosis→ middle water tank→ coarse mixed bed→ fine mixed bed→ pure water tank→ pure water pump→ ultraviolet sterilizer→ polishing mixed bed→ precision filter→ water-use point(≥18MΩ.CM) (conventional technology)
2. Pretreatment→ reverse osmosis→ middle water tank→ EDI unit→ pure water tank→ pure water pump→ UV sterilizer→ polishing mixed bed→ 0.2 or 0.5μmprecision filter→water-use point(≥18MΩ.CM) (new technology)
3. Pretreatment→ first-stage RO→ drug feeder(PH regulation) → middle water tank→ second-stage RO(positive charge RO membrane) → pure water tank→ EDI device→ UV sterilizer→0.2 or 0.5μm precision filter→ water-use point(≥17MΩ.CM) (new technology)
4. Pretreatment→ RO→ middle water tank→ water pump→ EDI device→ pure water tank→ pure water pump→ UV sterilizer→ 0.2 or 0.5μm precision filter→ water-use point (≥15MΩ.CM)(new technology)
5. Pretreatment→ RO→ middle water tank→ pure water pump→ coarse mixed bed→ fine mixed bed→ UV sterilizer→ precision filter→ water-use point (≥15MΩ.CM)(conventional technology)
III. Applications:
cleaning of electrolytic capacitor manufacturing aluminium foils and workpieces;
5. Pretreatment→ RO→ middle water tank→ pure water pump→ coarse mixed bed→ fine mixed bed→ UV sterilizer→ precision filter→ water-use point (≥15MΩ.CM)(conventional technology)
III. Applications:
cleaning of electrolytic capacitor manufacturing aluminium foils and workpieces;
Pure water for electronic tube production, pure water for production burdening of picture tubes and cathode ray tube;
Pure water for black and white picture tube fluorescent screen production, glass shell cleaning, sedimentation, moisture, membrane cleaning and tube neck cleaning;
Pure water for cleaning screen of liquid crystal display and pure water for burdening;
Pure water for cleaning silicon chips in the crystalline tube manufacture;
High pure water for cleaning silicon chips in the manufacture of integrated circuit
Pure water for semiconductor materials, components, printed circuit board and integrated circuit;
Semiconductor materials, crystal materials manufacture, processing, cleaning;
High-quality picture tube, fluorescent powder manufacture;
Polishing treatment of automobiles and household appliances;

