JTZ-1419 Magnetron sputtering coating machine  

 denote using vacuum cathode glow discharge technique to ionize and doposit the argon molocule(target) and cathode in order to bombard targets atoms on the substrates. This machine had been installed magnet behind cathode target seat what effect restrict second electron moves thus advance target sputtering capacity and deposit film rate.

Characteristic:The equipment integrates the plasma treatment, high effiency nonequilibrium cathode. It has the reliable Work, good repeatability and consistency, fast deposition rate, high adhesion, fine film, etc. The coating film is dense and hardness with low friction coefficient to keep the smoothness of original workpiece surface good flexibilitv hard to break and fall. The equipment makes full automation of the coating technology come true. It uses the vacuum coating technique to cost on the suface of the base material. It has the features of low cost, high qualifcation rate,green environmental Protection, etc.

    Applied industry: computer shell,mobile phone case,Plastic, ceramic, Glass, home appliance,etc. It can coat the composite metal film, alloy film, transparent(translucent)film, nonconductive film, electromagnetism shield film,special film, etc