Specifications for nickel chromium sputtering target
Composition: NiCr20 (wt%) 
Purity: 3N, 3N5
Shape: planar, rotary
Microstructure: uniform
Surface and tolerance: Precision fabricated and grounded. Roughness Ra 0.8-Ra 3.2 for target surface
Round size: dia 25~300mm,Thickness:3~10mm
Rectangular: Length up to 1500mm 
Process: vacuum induction melt technique;

Specifications for nickel vanadium sputtering target
Composition: NiV7(wt%) 
Purity: 3N, 3N5
Shape: planar, rotary
Microstructure: uniform
Surface and tolerance: Precision fabricated and grounded. Roughness Ra 0.8-Ra 3.2 for target surface
Round size: dia 25~300mm,Thickness:3~10mm
Rectangular: Length up to 1500mm 
Process: vacuum induction melt technique

Meanwhile, we also manufacturer many types of nickel base alloy targets including Nickel Chromium alloy sputtering target, Nickel Titanium alloy sputtering target, Nickel Copper alloy sputtering target and Nickel Iron alloy sputtering targets.

Competitive Advantages

Well and High Quality Control , 
Prompt Delivery , 
Competitive Prices , 
Earth-friendly Products , 
Small Order Acceptable , 
ODM Accepted , 
OEM Accepted.