High purity tungsten target and high purity tungsten  titanium alloy target, tungsten silicon composite target are generally used to produce various thin-film material by the method of magnetron sputtering. Ultrapure tungsten(5N or 6N),due to their high resistance, high temperature stability to the electron transfer as well as its ability of forming the stable silicide, thus in the electronic industry ,most of them are used as gate connection and obstruction materials in the form of sputtering thin films. Ultrapure tungsten and its silicide are used not only in super large scale integration as resistive layer, diffusion impervious layer etc but also in metal oxide semiconductor transistor as well as gate material and connection material  etc. Tungsten-Titanium alloy sputtering target is generally used for the production of the metal layer of thin film type solar cells.

Also, we manufacture tungsten wire, coil, sheet, bar, plate together with tungsten boat and tungsten crucibles with very good quality and best price.

Product Name	Tungsten Target	Tungsten Titanium target
Composition	W	WTi10
Purity	4N(99.99%), 5N(99.999%)	4N(99.99%), 5N(99.999%)
Dimension	Diameter:  6, 8, 10, 12 inch, Thickness:  0.25, 0.5, 0.75 inch	Diameter:  6, 8, 10, 12 inch, Thickness:  0.25, 0.5, 0.75 inch
Relative density	≥99%	≥99%
Grain Size	≯50μm	≯50μm
Defect Rate	0	0