The catalyst is the precious metal (Pd) - Semiconductor system, through a special process development and production of new high-efficiency deoxidizing catalyst. Mainly used in hydrogen in addition to oxygen, but also for nitrogen, argon, helium and other inert gases and carbon monoxide, carbon dioxide hydrogenation oxygen.

Features:

1. Precious metals (Pd) - Semiconductor system, high catalytic activity;
2. Without activation of regeneration, used for the first time without pretreatment;
3. Deep purification degree, residual oxygen is less than 0.5ppm;
4. Resistance to poisoning ability, especially for H2S, SO2, CL2, NH3 and other kinds of excellent resistance to poison ability; 
5. Withstand high temperature, 650 ℃ not ablation (the similar products highest is 450 ℃);
6. High strength, not pulverization, consecutive years using activity.

Service conditions and Technical parameters:

1. Catalyst reactor height-diameter ratio: ≥3;
2. Temperature: room temperature (warming better);
3. Space velocity: (5000~10000) hr-1;
4. Air oxygen content: ≤4%;
5. Purified gas residual oxygen content: ≤0.5ppm;
6. Visual shape: gray cylinder φ(2~6)mm;
7. Bulk density: 1.1 ± 0.1g/ml; 
8. Working pressure:  ≤27MPa;
9. Mechanical strength: 97N/grain;
10. Service life: ≥3years.

Applications:

Metallurgy, petroleum, chemicals, electronics, building materials, aerospace, pharmaceutical and other industries such as hydrogen and nitrogen, argon and other inert gases hydrogenation oxygen.