Hafnium oxide(HfO2) Sputtering Target 99.99%
Physical properties:
Color: White
Density: 9.68 g/cm3
Melting point: 2850
Target purity: 99.99%
Relative density > 99% Section 3.2 Ra roughness Tolerance of + / - 0.1 mm
Size: As customer request
Used:
Industrial coating, laboratory or research level using hafnium HfO2 target material target, electronics, photoelectricity, military, decorative, functional thin film and so on
The above offer just for reference, final price base on the quantity and size etc, so customer before order pls contact us for detail offer. Thank you!

