Description
Halocarbon 14, CF₄, (tetrafluoromethane) is a colorless, nonflammable, high-pressure gas.

Gas Data
Molecular Weight 88
Specific Gravity(Air=1) 3.04

Applications
With added oxygen, CF₄ (usually >80% mixture concentration) is used for plasma etching of
polysilicon, silicon dioxide, silicon nitride, refractory metals and metal silicides. Etching and
stripping of photoresists and other polymers are also major uses of CF₄ (usually <20%) and
oxygen mixtures.

Specifications