| After-sales Service Provided: | Engineers available to service machinery overseas |
|---|---|
| Condition: | New |
| Brand Name: | Wattsine |
| Weight: | 2000 kg |
| color: | white |
Quick Details
Specifications
1. Description
the HMPS-2060SP, 6kW microwave plasma chemical vapor deposition
(MPCVD) equipment is designed for multi-purpose with high stable and
Medium process pressure microwave plasma based on uses' specific
Requirements. the system is built with advanced performance, perfect
Function, reasonable structure, ease of use, safety and reliability and great
Appearance, with all the characteristics it is especially suitable for the
Application of CVD progress of monocrystalline and polycrystalline
Diamond film. Chemical vapor deposition (CVD) of polycrystalline diamond
Film, surface treatment and modification of materials, as well as the growth
of low temperature oxides.
2. Equipment composition and main features:
2.1. Microwave power generator
the system uses a newly developed 6kW/2450MHz solid-state microwave
Power generator. the microwave power is continuously adjustable from 0.1-6kW;
the stability is better than ±1%; the ripple is better than 1%, and it has good
Control performance; the PLC provides convenient control; the perfect line safety
Blocking control system is adopted to make the system has a long service life. It
Has excellent electrical performance, safe and reliable, simple and convenient
Operation.
2.2. Waveguide transmission unit
the system uses an excellent microwave transmission system consisting of a
High-performance microwave circulator, three-stub tuner, water load with
Reflected wave sampling, and a waveguide connected to the waveguide section. It
Ensures the good isolation of the reflected wave from the solid-state power source
to make it work stably. Can easily adjust the best match when the plasma load
Changes, to achieve the best transmission of microwave power. and through the
Reflected wave sampling, the reflected power and real - time working status are
Displayed in digital form.
2.3. Mode transformation and betting microwave coupling cavity
this is our new generation of relatively mature microwave mode conversion
and coupling cavity, which is composed of a cylindrical cavity working in TM
Mode, a door-type coaxial waveguide coupler with adjustable coaxial coupling
Probe, and a plate quartz window. by adjusting the short-circuit piston of
Waveguide and coaxial coupling probe, the microwave power can be coupled to
the plasma discharge chamber efficiently in a wide range of operation, and
High-density, high-ionization, large area of uniform and stable microwave
Discharge can be generated. It adopts double-layer water-cooled cavity wall to
Ensure stable operation.
2.4. Multi-port plasma discharge chamber
this system uses a large-volume discharge chamber made of stainless steel
Welded with a double-layer water cooling structure. the upper end is connected to
the microwave reaction chamber and is a continuation of the cylindrical chamber.
It also has the following functional ports:
1) A revolving door type feeding and discharging window is set in front of the
Cavity, which can be easily put into the sample platform of no less than 50mm
Substrate. It is also equipped with a reticulated microwave shielding window, so
as to clearly observe the discharge working condition in the cavity during
Operation; two observation windows and an infrared temperature measurement
Window are respectively provided in the left and right directions and the rear.
2) Specially designed inflatable flange is used to provide the main mixed gas,
Inflatable pipe and the inflatable ring near the substrate as a double-layer gas feed
System composed of auxiliary inflatable pipes.
the above design makes the port water-cooled discharge chamber with large
Volume and complete functions, especially suitable for the needs of small batch
Plasma processing.
2.5. Lifting adjustment of substrate platform and cavity plate
the substrate platform is a water-cooled lifting structure, and the device can
Continuously adjust the cavity plate and the sample substrate platform respectively
to make the plasma discharge area reach the best state, which is simple, reliable,
and easy to control. Can meet the requirements of a variety of plasma processing
Technology.
2.6. Vacuum acquisition and measurement
the system selects 600L/s molecular pump and 8L/s vacuum pump as the
Pumping system, and the ultimate vacuum is better than 6x10-6 torr. the system is
Equipped with a medium to low pressure measurement gauge from atmospheric to
10-7 torr and a piezoresistive vacuum gauge from 0 to 500 torr. the measuring
Instrument is placed in the cabinet for easy control and reading.
the static seals use metal seals and silicone rubber; dynamic seals use metal
Bellows and magnetic fluid seal structures. the cavity air pressure control adopts
MKS automatic controller, the air pressure control is stable and the adjustment is
Convenient.
2.7. Multi-channel gas Mass flow Control (MFC)
in order to ensure the process requirements of MPCVD, the system adopts the
4-way gas mass flow control system consisting of H2, CH4, O2 and N2 to supply
and control the system (MFC). Each channel is equipped with a electromagnetic
Valve, filter and EP grade 1/4' tube circuit and 1/4'VCR connector are built into
the equipment cabinet, the gas path is short, compact and easy to control.