Our company is a specialty manufacturer to engage in the manufacture of sputtering target materials in many years. We can supply a variety of high quality sputtering targets for the thin film in the following industries: glass, motor, machine work, optical coating, semiconductor, optical disk, magnetic head etc. In addition to domestic market, our products have been exported to foreign market including Germany, America. The quality of target materials is deeply trusted by our customer. Our sputtering target products made by hot isostatic pressure, they have four characteristics i.e. high purity, high density, good organizations structure, long life-span, they are the best manufacturing of magnetic control sputtering target. Metal Sputtering Targets (include Rare Earth metal Sputtering Target): Cr,Al, Sb, Bi, B, Cd, C, Ce, Co, Cu, Dy, Er, Eu, Gd, Ge, Au, C, Hf, Ho, In, Ir, Fe, La, Lu, Mg, Mn, Mo, Nd, Ni, Nb, Pd, Pt, Pr, Re, Ru, Sm, Se, Sc, Ag, Si, Ta, Tb, Tm, Sn, Ti, W, V, Yb, Y, Zr, Zn, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sc, Y Alloy Sputtering Targets: TiAl, AlCu, AlCr, AlMg, AlSi, AlSiCu, AlAg, AlV, CaNiCrFe, CaNiCrFeMoMn, CeGd, CeSm, CrSi, CoCr, CoCrMo, CoFe, CoFeB, CoNi, CoNiCr, CoPt, CoNbZr, CoTaZr, CoZr, CrV, CrB, CrSi, CrCu, CuCo, CuGa, CuIn, CuNi, CoNiPt, CuZr, DyFe, DyFeCo, FeB, FeC, FeMn, GdFe, GdFeCo, HfFe, IrMn, IrRe, InSn, MoSi, NiAl, NiCr, NiCrSi, NdDyFeCo, NiFe, NiMn, NiNbTi, NiTi, NiV, SmCo, AgCu, AgSn, TaAl, TbDyFe, TbFe, TbFeCo, TbGdFeCo, TiNi, TiCr, WRe, WTi, WCu, ZrAl, ZrCu, ZrFe, ZrNb, ZrNi, ZrTi, ZrY, ZnAl, ZnMg Boride Sputtering Targets: Cr2B, CrB, CrB2, Cr5B3, FeB, HfB2, LaB6, Mo2B, Mo2B5, NbB, NbB2, TaB, TaB2, TiB2, W2B, WB, VB, VB2, ZrB2 Carbide Sputtering Targets: B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, TiC, WC, W2C, VC, ZrC Fluoride Sputtering Targets: AlF3, BaF3, CdF2, CaF2, CeF3, DyF3, ErF3, HfF4, KF, LaF3, PbF2, LiF, PrF3, MgF2, NdF3, ReF3, SmF3, NaF, Cryolite, Na3AlF6, SrF2, ThF4, YF3, YbF3 Nitrides Sputtering Targets: AlN, BN, GaN, HfN, NbN, Si3N4, TaN, TiN, VN, ZrN Oxide Sputtering targets:Al2O3, Sb2O3, ATO, BaTiO3, Bi2O3, CeO2, CuO, Cr2O3, Dy2O3, Er2O3, Eu2O3, Gd2O3, Ga2O3, GeO2, HfO2, Ho2O3, In2O3, ITO, Fe2O3, Fe3O4, La2O3, PbTiO3, PbZrO3, LiNbO3, Lu3Fe5O12, Lu2O3, MgO, MoO3, Nd2O3, Pr6O11, Pr(TiO2)2, Pr2O3, Sm2O3, Sc2O3, SiO2, SiO, SrTiO3, SrZrO3, Ta2O5, Tb4O7, TeO2, ThO2, Tm2O3, TiO2, TiO, Ti3O5, Ti2O3, SnO2, SnO, WO3, V2O5, YAG, Y3Al5O12, Yb2O3, Y2O3, ZnO, ZnO: Al, ZrO2(unstabilized), ZrO2-5-15wt%CaO) Selenides Sputtering Targets: Bi2Se3, CdSe, In2Se3, PbSe, MoSe2, NbSe2, TaSe2, WSe2, ZnSe Silicides Sputtering Targets: Cr3Si, CrSi2, CoSi2, HfSi2, MoSi2, NbSi2, TaSi2, Ta5Si3, TiSi2, Ti5Si3, WSi2, V3Si, VSi2, ZrSi2 Sulfides Sputtering Targets: Sb2S3, As2S3, CdS, FeS, PbS, MoS2, NbS1.75, TaS2, WS2, ZnS, Tellurides Sputtering Targets: CdTe, PbTe, MoTe2, NbTe2, TaTe2, WTe2, ZnTe Other: Cr-SiO, GaAs, Ga-P, In-Sb, InAs, InP, InSn, Purity:99%,99.9%,99.95% 99.99%,99.995% 99.999% and 99.9999%. Shape: Foil, sheet, rod, pipe, tube, ring, wafer, plate, tablet and base on your drawing. Disk, rectangle, band, rod and other shapes Dimension: Diameter (<650mm), Length (<1600mm), Width (<500mm), Thickness (>1mm), Custom-Made. Packing: wooden box. The pure Cr and Ti-Al alloy produced are our primary goods .We supply about 7000pieces/year.by advanced HIP have many advantages, such as high purity, high density, homogenous microstructure, fine grain, long working life etc. We would be interested in receiving your inquiries for all Goods,against which we will send you our quotations in USD or EUR,FOB Beijing of China or DDU your ports, packing included. Terms of payment to be arranged . Our production are in high quality and lower price in china. Please feel free to contract! We believe that you will be satisfied with our products and services. Wish we will have a pleasent and successful cooperation!